An analytical method was proposed for the determination of 16 impurities in pure rhodium by inductively coupled plasma mass spectrometry (ICP-MS). These impurities include Mg, Al, Si, Mn, Fe, Ni, Cu, Zn, Ru, Ag, Pd, Sn, Ir, Pt, Au and Pb. Rhodium samples to be tested was digested by a mixture of HCl and H2O2 in microwave oven. The interference of multifunctional ions to Fe and Si was eliminated by the dynamic reaction cell technology (DRC). Y, Re, Sc and In were used as internal elements for the 16 impurities. The recoveries and precision (RSD) were measured to be 88.5%~116.2% and 0.63%~13.44%, respectively. Detection limit was 0.0001% for Fe, 0.0005% for Si and 0.00005% for other elements. The method can be applied to the analysis of 99.99% high-purity rhodium, in case of no rhodium matrix matching available. |