| Ruthenium targets have important applications in electronic information industry, and there was still a certain gap between the domestic targets preparation technology and the international level. The characteristics of various traditional purification processes and new purification processes are reviewed. The difference of ruthenium target produced by hot pressing (HP), direct hot pressing (DHP) and spark plasma sintering (SPS) was compared. The effects of the purity, relative density, grain size, crystal orientation, composition and tissue uniformity of targets on the sputtered films were analyzed. The constraints and development direction of high quality target were discussed. |
