文章摘要
纯银溅射靶材的制备、微观结构及溅射成膜研究
Preparation, microstructure and film formation of pure silver sputtering target material
投稿时间:2023-05-15  
DOI:
中文关键词: Ag溅射靶材  冷轧  再结晶退火  Ag薄膜  微观结构
英文关键词: Ag sputtering target  cold rolling  recrystallization annealing  Ag thin film  microstructure
基金项目:云南省国际合作计划项目(2014IA037);云南省创新团队项目(2019HC024);云南省科技厅科研院所技术开发研究专项(2018DC004)
作者单位
宁哲达 昆明贵金属研究所 云南贵金属实验室有限公司昆明650106 
唐可 昆明贵金属研究所 云南贵金属实验室有限公司昆明650106 
施晨琦 昆明贵金属研究所 云南贵金属实验室有限公司昆明650106 
闻明 昆明贵金属研究所 云南贵金属实验室有限公司昆明650106 
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中文摘要:
      银薄膜作为高新技术领域极具潜力的新材料,在现代工业中得到了广泛的应用。以银靶为源材料的磁控溅射已成为制备银薄膜的常用方法。本研究比较了冷轧状态和退火状态下Ag靶的溅射性能,探讨了Ag靶与Ag薄膜之间的关系。结果表明:冷轧变形量为83.33%后进行600 ℃退火可以有效提高Ag{110}的织构密度。冷轧态和退火态Ag靶具有相似的沉积速率。两种Ag薄膜的电阻率均随溅射时间的延长而降低。在溅射时间相同的情况下,退火态Ag靶溅射的Ag薄膜电阻率低于冷轧态Ag靶溅射的Ag薄膜。退火态Ag靶组织均匀,溅射后溅射跑道较浅。
英文摘要:
      As a promising new material, silver thin film has been widely used in modern industry. Magnetron sputtering with a silver target as the source has become a common method to produce silver film. In this research, the sputtering performance of Ag targets in cold rolling state and annealing state was compared and the relationship between the Ag targets and Ag thin films was explored. The results show that annealing at 600 ℃ after cold rolling to a deformation of 83.33% can effectively increase the texture density of {110} in Ag. Both in the cold rolling state and annealing state, Ag targets exhibited a similar deposition rate. The resistivity of both kinds of Ag thin films decreases with the sputtering time. Ag thin films formed by sputtering Ag targets of two states for the same sputtering time displayed different resistivity, with the annealing state being superior over the rolling state. Ag target in annealing state, owing its uniform microstructure, showed shallower depth of rack track after sputtering. Annealing treatment after cold rolling is an alternative method to improve the target microstructure.
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