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| 溅射靶材用高纯钌粉制备技术研究及进展 |
| Research and Development of Preparation Technology of High Purity Ruthenium Powder for Sputtering Target |
| Received:April 26, 2017 |
| DOI： |
| 中文关键词: 钌靶 钌粉 氯钌酸铵 |
| 英文关键词: ruthenium target ruthenium powder ammonium chloride |
| 基金项目:云南省科技计划项目-重点新产品(2016BA001)、云南省引进海外高层次人才项目(13020149)。 |
| Author Name | Affiliation | E-mail | | ZHAO Panchao | Kunming Institute of Precious Metals, Kunming 650106, China
Northwest Institute For Non-ferrous Metal Research, Xi'an 710016, China | 564070695@qq.com | | GUO Lei | Kunming Institute of Precious Metals, Kunming 650106, China | | | CHEN Jialin | Kunming Institute of Precious Metals, Kunming 650106, China | | | CAO Qigao | Northwest Institute For Non-ferrous Metal Research, Xi'an 710016, China | | | YI Wei | Kunming Institute of Precious Metals, Kunming 650106, China | yiwei@ipm.com.cn |
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| 中文摘要: |
| 电子工业生产钌靶对所用的钌粉纯度(99.999%)、分散性、形貌和尺寸等有严格的要求。国内目前只能在实验室制备出高性能的钌粉，尚未应用于生产，在制备高性能钌粉方面与国外有较大差距，且国内钌靶用钌粉主要依靠进口。通过分析和总结了国内外钌靶用钌粉的生产方法、工艺和测试方法，并对国内钌靶用钌粉的制备提出了建议。 |
| 英文摘要: |
| The ruthenium powder of ruthenium target in the electronics industry has strict requirements for the purity(99.999%), dispersibility, morphology and size. High-performance ruthenium powder is only prepared in the laboratory, and has not yet been used in production. In the preparation of high-performance ruthenium powder, there is a big gap with foreign countries, and the ruthenium target used in China mainly relies on imports. The production methods, process and test methods of Ru powder for ruthenium target are analyzed and summarized at home and abroad, and some suggestions on preparation Ru powder for ruthenium target are also proposed in China. |
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