|
| 钌粉提纯和钌靶制备的研究进展 |
| Progress in Refining of Ruthenium Powder and Preparation of Ruthenium Target |
| Received:July 26, 2018 |
| DOI： |
| 中文关键词: 金属材料 钌 靶材 提纯 制备 溅射薄膜 |
| 英文关键词: metal materials ruthenium sputter target purification preparation sputtered films |
| 基金项目:国家重点研发计划项目(2017YFB0305503)、云南省院所专项项目(2009CF003)。 |
| Author Name | Affiliation | E-mail | | DENG Rui | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd.,Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China | dengrui1992@163.com | | WEN Ming | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd.,Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China | wen@ipm.com.cn | | CHEN Jialin | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd.,Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China | | | GUO Junmei | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd.,Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China | | | DU Yilin | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd.,Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China | |
|
| Hits: 3536 |
| Download times: 2869 |
| 中文摘要: |
| 钌靶在电子信息行业中具有重要的应用价值，我国的钌靶制备技术与国外相比尚存在一定差距。综述了钌提纯中传统提纯工艺和新提纯工艺的特点。对比了热压(HP)、直接热压(DHP)和放电等离子烧结(SPS)等不同工艺加工所得钌靶的差异。分析了靶材的纯度、密度、晶粒大小、晶面取向、成分和组织的均匀性等特性对溅射薄膜的影响。探讨了高品质钌靶的制约因素和发展方向。 |
| 英文摘要: |
| Ruthenium targets have important applications in electronic information industry, and there was still a certain gap between the domestic targets preparation technology and the international level. The characteristics of various traditional purification processes and new purification processes are reviewed. The difference of ruthenium target produced by hot pressing (HP), direct hot pressing (DHP) and spark plasma sintering (SPS) was compared. The effects of the purity, relative density, grain size, crystal orientation, composition and tissue uniformity of targets on the sputtered films were analyzed. The constraints and development direction of high quality target were discussed. |
|
View Full Text
View/Add Comment Download reader |
| Close |
|
|
|