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| 磁控溅射沉积钌薄膜的微观结构及生长过程 |
| Microstructure and Growth of Ruthenium Films Deposited by Magnetron Sputtering |
| Received:October 20, 2019 |
| DOI： |
| 中文关键词: 磁控溅射 钌薄膜 微观形貌 薄膜生长模型 |
| 英文关键词: magnetron sputtering ruthenium films micro morphology thin films growth model |
| 基金项目:国家重点研发计划(2017YFB0305501)；云南省科技厅基础研究计划青年项目(2019FD140)；云南省创新团队(2019HC024)；昆明市稀贵金属溅射靶材科技创新团队(13020169) |
| Author Name | Affiliation | E-mail | | SHEN Yue | Sino-Platinum Metals Co.Ltd., Kunming 650106, China | | | YU Deng-de | Sino-Platinum Metals Co.Ltd., Kunming 650106, China
Kunming University of Science and Technology, Kunming 650093, China | | | WANG Shu-ming | Guobiao Beijing Testing & certification Co.Ltd., Beijing 100088, China | | | XU Yan-ting | Sino-Platinum Metals Co.Ltd., Kunming 650106, China | | | WANG Chuan-jun | Sino-Platinum Metals Co.Ltd., Kunming 650106, China | | | SHI Chen-qi | Sino-Platinum Metals Co.Ltd., Kunming 650106, China | | | WEN Ming | Sino-Platinum Metals Co.Ltd., Kunming 650106, China | wen@ipm.com.cn | | DU Feng-zhen | Guobiao Beijing Testing & certification Co.Ltd., Beijing 100088, China | |
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| 中文摘要: |
| 采用射频磁控溅射，通过改变基底温度、溅射时间、基底形貌，制备不同参数的钌薄膜。结果表明，该工艺制备的钌薄膜均没有明显的择优取向。随着溅射温度的升高，薄膜的致密性不断提高，表面由平整向起伏型结构转变，晶粒尺寸出现先增大后减小的趋势。随着溅射时间的增加，晶粒尺寸小幅增加，晶粒由圆形状演变为致密的长条状。在表面形貌较平坦的基底上更易获得光滑而致密的钌薄膜。在此基础上，研究并讨论了不同基底形貌上钌薄膜的生长方式。 |
| 英文摘要: |
| RF magnetron sputtering was used to prepare Ru films with different parameters by changing substrate temperature, substrate morphology and sputtering time. The results showed that the Ru films prepared by this process had no obvious preferential orientation. With the increase of sputtering temperature, the densification of the films continues to improve, the surface changes from flat to structural fluctuation, and the grain size first increases and then decreases. With the increase of sputtering time, the grains size increases, and the grains changes from roundness to dense long strip. It is easier to obtain smooth and compact Ru films on substrate with flat surface morphology. The growth patterns of Ru films on different substrate morphologies were studied and discussed. |
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